Easy atmospheric pressure SiO2 coating! Plasma coat UL-Colat
Demo available at our company! New technology launched in the market. CVD with atmospheric pressure plasma. Capable of handling small quantities and a variety of products.
The SiO2 film formation using plasma CVD, which has been conducted under reduced pressure until now, can now be performed at atmospheric pressure. The thickness can be controlled depending on the processing conditions (such as speed, liquid volume, distance, etc.). This allows for small-scale production and fine adjustments to conditions that were not feasible with conventional large CVD systems, making it possible to reduce film formation costs. Operation is simple with a touch panel. By saving the condition settings, it is possible to perform film formation under the same conditions in subsequent runs. This is a groundbreaking piece of equipment that is unparalleled in the market using plasma treatment devices. It can be used for a wide range of applications, from mass production to R&D. It is possible to modify wettability through surface treatment with plasma and perform SiO2 coating using the same machine. If plasma coating is not performed, it can also be used as a standard plasma treatment machine for pre-treatment before painting or ink adhesion.
- Company：ケー・ブラッシュ商会 本社
- Price：Other
